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etch |
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Typical applications for the 901ACS include nitride etch, photoresist descum, polyimide and BCB etches, zero layer etch, backside etch, isotropic oxide etch, non-critical polysilicon etch and titanium/tantalum alloy etch. Timed etches simply cannot deliver this degree of accuracy. Typical applications for the 901e include nitride etch, photoresist descum, polyimide and BCB etches, zero layer etch, backside etch, isotropic oxide etch, non-critical polysilicon etch and titanium/tantalum alloy etch. |
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