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A prototype DSi(TM) module is available on an Omega(R) 201 etcher at Trikon for demonstrating deep Si etches to MEMS customers.
13 micron designs, including critical self-aligned contacts and bi-level contacts, small-geometry via, spacer and hardmask etches, as well as new low k materials and damascene structures.
18 micron and beyond applications, ranging from damascene structures to high aspect ratio contacts, self-aligned contacts and low k etches.