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patterning |
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| For instance, photolithography requires two steps to form and pattern a film, whereas MIMIC requires only one - since forming and patterning a polymer film occur simultaneously. Photolithography systems are currently reaching the physical limits of their resolution, and thus problems with advanced semiconductor designs, particularly densely populated circuit patterns, are inevitable. Today's semiconductor manufacturers use photolithography to etch microscopic circuits onto computer chips: They shine light through a mask onto a photosensitive surface to create the circuit's pattern. |
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