dual chambered

See: bicameral
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The dual chambered EpiPro 5000 is the only epitaxial reactor that has the flexibility to process a broad range of epitaxial silicon thicknesses, from 1 to more than 100 microns, with tight process control for all film thicknesses.
The unique chamber design ensures that films on both sides of the wafer are simultaneously etched in the chemical dry etching environment, two wafers at a time in a single chambered system, and as many as four wafers at a time in a dual chambered system.