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Typical applications for the 901e include nitride etch, photoresist descum, polyimide and BCB etches, zero layer etch, backside etch, isotropic oxide etch, non-critical polysilicon etch and titanium/tantalum alloy etch.
Tegal is a technical leader in the plasma etches of new thin films in the FeRAM, MRAM, telecommunications, magnetic storage, and MEMS device arenas.
The method consecutively deposits polymer and etches the silicon so as to produce a net anisotropic etch profile with high selectivity to the mask.