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SEMATECH experts will present world-leading research and development results on extreme ultraviolet (EUV) manufacturability and extendibility, alternative lithography, and related areas of metrology at the SPIE Advanced Lithography 2013 conferences taking place February 25-28 at the San Jose Convention Center and Marriott in San Jose, CA.
SEMATECH engineers will report progress on EUV mask infrastructure, manufacturability, advancing extendibility, alternative lithography, metrology and will showcase some of their findings in over 20 papers demonstrating breakthrough results in exposure tool capability, resist advances, defect-related inspection, reticle handling, and nanoimprint.
For immersion double patterning, cost of ownership, overlay capability, and extendibility to the next-generation device are still the top challenges.
SEMATECH engineers will report their progress on assessing EUV lithography (EUVL) manufacturability and on advancing EUVL extendibility and alternative lithography and will showcase some of their findings in 12 papers demonstrating breakthrough results in exposure tool capability, resist advances, defect-related inspection, reticle handling, and nanoimprint.
Extendibility isn't the only feature that makes ReachView's Security Portal[TM] stand out.
By adding patented contact technology and extendibility to support a wide range of chip geometries, ESI's 3352 is uniquely suited for high-capacity testing applications.